2382-59-4 Purity
96%
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Specification
Feougier, Raphaël, et al. Journal of Vacuum Science & Technology A 41.1 (2023).
Neopentyl methacrylate serves as the monomer for an initiated chemical vapor deposition process that produces poly(neopentyl methacrylate) thin films acting as inhibiting layers for area-selective atomic layer deposition of zinc oxide and tin dioxide in microelectronic manufacturing.
Experimental Protocol: The monomer is delivered at 0.189 g/min with tert-butyl peroxide initiator at 4 standard cubic centimeters per minute and argon carrier at 50 SCCM under 0.75 Torr total pressure, with the substrate stage cooled to 13 degrees Celsius and deposition times varied from 100 to 1000 s. Oxide growth is subsequently performed at 150 degrees Celsius using diethylzinc and water, or tetrakis(dimethylamino)tin and hydrogen peroxide, with 0.015 s pulses and 15 s purges.
Performance Evaluation: A 12 nm polymer film inhibits up to 100 nm of zinc oxide growth, and selectivity approaches unity when the polymer exceeds 12 nm, while 6.4 nm and 3.1 nm films inhibit 50 nm and 10 nm of oxide respectively. The zinc oxide growth rate on silicon is 0.17 nm per cycle and tin dioxide 0.1 nm per cycle. Inhibition of tin dioxide is maintained for 222 cycles corresponding to 22 nm from a 6 nm film.
El Sabahy, Julien, et al. Sensors and Actuators B: Chemical 202 (2014): 941-948.
Neopentyl methacrylate is polymerized by initiated chemical vapor deposition into a thin sensitive film that concentrates gaseous toluene, providing the recognition element of a quartz crystal microbalance sensor for volatile organic compound detection.
Experimental Protocol: A 200 nm polymer film is deposited on a 10 MHz crystal with an electrode area of 0.205 cm2, and the coated resonator is exposed to toluene concentrations from 350 to 1880 ppm, equivalent to 1.39 x 10-2 to 7.62 x 10-2 mol/m3, in 15 min steps separated by 10 min nitrogen purges at ambient temperature and below 1% humidity. Frequency shifts are recorded to derive partition coefficients, and sorption kinetics are interpreted with a Langmuir adsorption model supported by finite element simulations.
Performance Evaluation: The partition coefficient reaches 2800 at 350 ppm and decreases to 2000 at 1880 ppm, indicating a high affinity comparable with state of the art organic polymers. Langmuir parameters of 9.26 x 10-5 mol/m2 for site density and 1.50 x 10-1 mol/m3 for half saturation concentration reproduce the data with R squared above 0.99. Response times range from 76 s to 50 s with desorption near 80 s.
The molecular formula of neopentyl methacrylate is C9H16O2.
The synonyms for neopentyl methacrylate are 2397-76-4, neo-pentyl methacrylate, and 2,2-dimethylpropyl 2-methylprop-2-enoate.
The molecular weight of neopentyl methacrylate is 156.22 g/mol.
Neopentyl methacrylate was created on August 8, 2005.
The IUPAC name of neopentyl methacrylate is 2,2-dimethylpropyl 2-methylprop-2-enoate.
The InChI of neopentyl methacrylate is InChI=1S/C9H16O2/c1-7(2)8(10)11-6-9(3,4)5/h1,6H2,2-5H3.
The InChIKey of neopentyl methacrylate is OOHZIRUJZFRULE-UHFFFAOYSA-N.
The canonical SMILES of neopentyl methacrylate is CC(=C)C(=O)OCC(C)(C)C.
The CAS number of neopentyl methacrylate is 2397-76-4.
The XLogP3 value of neopentyl methacrylate is 3.3.
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