Duan Y1, Gao F1, Teplyakov AV1.
J Phys Chem C Nanomater Interfaces. 2015 Dec 3;119(48):27018-27027. Epub 2015 Nov 4.Surface-limited deposition reactions leading to the formation of copper nanoparticles on H-terminated Si(111) surface can serve as a model for understanding the role of structure of the deposition precursor molecules in determining the oxidation state of the metal deposited. This study compares three different precursor molecules: Cu(acac)2 (Cu(II) acetylacetonate), Cu(hfac)2, and Cu(hfac)VTMS (Cu(I)-(hexafluoroacetylacetonato)-vinyltrimethylsilane) as copper deposition sources in a process with a controlled oxidation state of copper. Read More