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Home > Products > Material & Chemicals > Micro/NanoElectronics > Tetrakis(dimethylamino)titanium(IV)

Catalog Number
ACM3275249
Product Name
Tetrakis(dimethylamino)titanium(IV)
Structure
CAS
3275-24-9
Synonyms
Tetrakis(dimethylamido)titanium(IV), packaged for use in deposition systems; Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM; titanium tetrakis(dimethylamide); Methanamine, N-methyl-, titanium(4+) salt (4:1); NSC130237; 3275-24-9; ACMC-209hva; I14-100288; Tetrakis(Dimethylamino)Titanium (Metals Basis); Titanium(IV) dimethylamide;
EC Number
221-904-3
NSC Number
130237
IUPAC Name
dimethylazanide;titanium(4+);
Molecular Formula
C8H24N4Ti;
Molecular Weight
224.175g/mol
Exact Mass
224.148g/mol
Monoisotopic Mass
224.148g/mol
Topological Polar Surface Area
4A^2
Heavy Atom Count
13
Complexity
24.1
Covalently-Bonded Unit
5
SMILES
C[N-]C.C[N-]C.C[N-]C.C[N-]C.[Ti+4];
InChI
InChI=1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4;
InChI Key
MNWRORMXBIWXCI-UHFFFAOYSA-N;
H-Bond Acceptor
4
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1 Structure and photoluminescence of the TiO2 films grown by atomic layer deposition using tetrakis-dimethylamino titanium and ozone.

Jin C1, Liu B1, Lei Z2, Sun J1.

Nanoscale Res Lett. 2015 Feb 28;10:95. doi: 10.1186/s11671-015-0790-x. eCollection 2015.

TiO2 films were grown on silicon substrates by atomic layer deposition (ALD) using tetrakis-dimethylamino titanium and ozone. Amorphous TiO2 film was deposited at a low substrate temperature of 165°C, and anatase TiO2 film was grown at 250°C. The amorphous TiO2 film crystallizes to anatase TiO2 phase with annealing temperature ranged from 300°C to 1,100°C in N2 atmosphere, while the anatase TiO2 fi ... Read More

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Email:
Tel:1-201-478-8534
1-516-662-5404
Fax: 1-516-927-0118
Address: 2200 Smithtown Avenue, Room 1 Ronkonkoma, NY 11779-7329 USA