Alfa Chemistry offers a wide range of different products which are used in various areas of micro/nanoelectronics. These products have a widely application, mainly in molecular self-assembly, chemical vapor deposition (CVD), chemical solution deposition (CSD), atomic layer deposition (ALD), lithography and nanopatterning. We also supply electronic chemicals, electronic materials and pure elements for your research.
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Molecular self-assembly is a kind of molecular aggregates or supramolecular structures which is clear and stable, with some specific function or property formed by spontaneous combination of non-covalent interactions between molecules. The core is molecular recognition, including intermolecular geometric identification and intrinsic driving force of the three-dimensional effect and long-range effect. Molecular self-assembly materials have unique functions such as light, electricity and catalysis, and have great application value in molecular devices, molecular control and other fields.
Chemical vapor deposition (CVD) is a vapor growth method for material preparation by introducing one or more compounds containing thin film elements into a reaction chamber and after that the solid film is deposited on the surface of the substrate by means of the vapor phase chemical reaction.
Chemical solution deposition (CSD) includes sol-gel method and metal organic thermal decomposition method (MOD), referring to the process of the settling of particles (atoms or molecules) from a solution or suspension onto a pre-existing surface, resulting in the growth of a new phase. CSD can be used to prepare ferroelectric thin films or multilayer composite films.
Atomic layer deposition (ALD) is a method in which a substance can be placed on a substrate surface in the form of a single atom film.ALD has a wide range of applications in the fields of micro/nano electronics and nanomaterials due to its highly controllable (thickness, composition and structure), excellent deposition uniformity and consistency.
Nanoimprint lithographyemboss and copynano-pattern in the fine proportion on the silicon substrate coated with polymer materials with a mechanical force (high temperature, high pressure) according to a nanoscale template, the processing resolution is only related to the size of the template pattern. NIL technology can be used in a wide range of applications, covering nanoelectronic components, biological or chemical silicon laboratory, micro-flow device (micro-mixer, micro-reactor), ultra-high storage density disk, micro-optical components and other fields.
Microcontact printing is a form of soft lithography which uses the relief patterns on a master polydimethylsiloxane (PDMS) stamp to form patterns of self-assembled monolayers (SAMs) of ink on the surface of a substrate through conformal contact. The applications of microcontact printing are wide ranging including surface chemistry, microelectronics and cell biology.