Violet P1, Nuta I, Chatillon C, Blanquet E.
Rapid Commun Mass Spectrom. 2010 Oct 30;24(20):2949-56. doi: 10.1002/rcm.4727.Organometallic molecules are commonly used as gaseous precursors in Atomic Layer Deposition/Chemical Vapor Deposition (ALD/CVD) processes. However, the use of these molecules, which are generally thermally unstable at temperatures close to the deposition temperature, requires an understanding of their gas-phase chemical behavior. The thermal cracking of the gaseous precursor, pentakis(dimethylamino ... Read More