Thin film deposition is one of the technical tools used in chemical manufacturing processes. We have experienced staff, as well as a wide range of processing tools. Our Leybold Heraeus Z-400 Sputtering System #2-based thin film deposition services can help you choose the best tools and processes for your research.
Leybold Heraeus Z-400 Sputtering System #2
1. Four targets, 75 mm, RF or DC
2. Up to 2'' wafer
3. Turbo pump
4. Substrate heater (850℃ max.)
5. 500 W DC power supplies, 600 W RF power supplies, substrate bias
If you would like to find out more about our Leybold Heraeus Z-400 Sputtering System #2-based thin film deposition services, please contact us directly.
For research use only, not intended for any clinical use.
Please fill out the form below and we will get back to you as soon as possible with a quotation for the item you are interested in.