Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on Raith 150, e-beam Lithography.
Raith 150, e-beam Lithography
Beam size:
1. 3.0 nm at 1kV and 30 micron aperture
2. 1.5 nm at 20 kV and 30 micron aperture
The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.
Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our Raith 150, e-beam Lithography-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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