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Nanofabrication Service—Oxford Instruments Plasma Lab 80+ PECVD and Etching

Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on Oxford Instruments Plasma Lab 80+ PECVD and Etching.

Name Of The Instrument/Platform

Oxford Instruments Plasma Lab 80+ PECVD and Etching

Introduction

The Oxford Plasmalab80 is a unique tool which combines etch and deposition capabilities into one tool. The Oxford system can etch high aspect ratio features using either the Bosch (gas chopping) or cryo processes. The system produces very high plasma energies through the use of a remote plasma chamber and an inductively coupled plasma generator, this set-up reduces the need for elaborate precursor development and gives significant control of the impact energy that ions have with the substrate. Depositions of silicon dioxide, silicon nitride, or mixed oxynitrides can be made with the substrate held at room temperature. The plasmalab system gives us the capability to deposit high quality, smooth, pinhole free glass films onto plastic or organic substrates with very little substrate damage. The system can handle wafers up to 8' wafers in diameter, although the active etch/dep region is the center 4' of the chamber. Several recipes are available, and recipe development is very straightforward.

Feature Highlights

System Characteristics:
1. Available gases:
1) N2, N2O, O2, SF6, Ar with max flow of 100 sccm
2) C4F8, SiH4, CH4 with max flow of 20 sccm
2. Power: 300W RF and 300W ICP
3. Process Pressure from 4 to 100 mTorr
4. Temperature substrate can be controlled from -150 to 200C.
5. Can be used for both materials growth and etching

Summary

Equipment Type:
Cleanroom Instrumentation
Nano and Micro Fabrication
Plasma Etching and Material Growth

Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our Oxford Instruments Plasma Lab 80+ PECVD and Etching-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.

For research use only, not intended for any clinical use.

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