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Nanofabrication Service—March Plasma CS170IF RIE Etching System

Nanofabrication is the high point of global competition in manufacturing technology, aiming to provide specific functions for products and devices through nano-precision manufacturing, nano-scale manufacturing, and cross-scale manufacturing. The development of nanofabrication technology has enabled the movement of manufacturing objects from the macroscopic to the mesoscopic and microscopic, resulting in a deeper study of manufacturing science and an expansion of the intersection and integration of different disciplines. Alfa Chemistry provides nanofabrication services to our customers based on March Plasma CS170IF RIE Etching System.

Name Of The Instrument/Platform

March Plasma CS170IF RIE Etching System

Introduction

The reactive ion etcher is capable of etching oxides, nitrides as well as remove organic contamination from sample surfaces. The unit is outfitted with 4 mass flow controllers for reproducible gas flow.
The system can be currently operated only in manual mode.

Feature Highlights

System Characteristics:
1. Available gases: CF4, SF6, O2 and Ar etch chemistry
2. 6-inch electrode
3. Maximum power: 600W
4. Note: Operate the system only up to 300W. At 300W operate only for 10 minutes at a time. Over 300W ask our staff for assistance.

Summary

Equipment Type:
Cleanroom Instrumentation
Nano and Micro Fabrication
Plasma Etching and Material Growth

Alfa Chemistry is dedicated to the development of new manufacturing theories, methods, and processes that enable deeper research in manufacturing science. Our March Plasma CS170IF RIE Etching System-based nanofabrication services will provide you with the most solid support for your materials research. If you are interested, please feel free to contact us.

For research use only, not intended for any clinical use.

Online Inquiry

Please fill out the form below and we will get back to you as soon as possible with a quotation for the item you are interested in.

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