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Metrology Service—FEI Sirion 600 SEM/JC Nabity NPGS E-Beam Lithography

In recent years, as scientists continue to research more and more into materials science, the new materials industry, especially the nanomaterials industry, has grown and developed, placing new and higher demands on metrology in related fields. Metrology services are an area of expertise for Alfa Chemistry and we can provide our customers with solutions based on FEI Sirion 600 SEM/JC Nabity NPGS E-Beam Lithography.

Name Of The Instrument/Platform

FEI Sirion 600 SEM/JC Nabity NPGS E-Beam Lithography

MANUFACTURER: FEI

Summary

1. Ultra high resolution FE-SEM with 2 nm resolution
2. Motorized stage with full travel over a 150 mm wafer, 60° tilt
3. JC Nabity Nanometer Pattern Generation System (NPGS) e-beam lithography
4. Writes lithography patterns down to less than 15 nm
5. PMMA and developer in stock for e-beam lithography
6. NPGS and CAD software available for office use

The Materials Analysis Laboratory at Alfa Chemistry can provide FEI Sirion 600 SEM/JC Nabity NPGS E-Beam Lithography-based metrology services to our clients. If you would like to receive details of this project, please contact us directly.

For research use only, not intended for any clinical use.

Online Inquiry

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