Alfa Chemistry' materials analysis laboratories are equipped with world-class materials analysis instruments to provide comprehensive materials analysis services for high-tech companies in materials chemistry, metallurgy and minerals, electrical and electronics, biomedicine, semiconductor, and superconductivity, and nanotechnology to meet their requirements for morphological observation, trace surface analysis, materials composition analysis, and microstructure analysis at sub-micron resolution. We provide you with material analysis solutions based on ThermoFisher Helios G4 PFIB DualBeam.
ThermoFisher Helios G4 PFIB DualBeam
MANUFACTURER: Thermo Fisher Scientific
Electron Source: Schottky FEG
1. Landing Voltage: 50V to 30kV
2. 0.7 nm resolution at optimal conditions
Ion Source: Xe ion plasma
1. Landing Voltage: 2kV to 30kV
2. < 25 nm resolution at coincident point
Detectors (type):
1. SEM ETD (secondary e-'s)
2. SEM TLD (secondary or backscattered)
3. STEM-III (bright field/dark field transmitted)
4. ICE (secondary electron/ion)
5. EDAX Velocity EBSD camera for (3D)EBSD mapping
6. Edax Octane EDS detector for (3D)EDS mapping
Gas Delivery: MultiChem integrated system
1. Currently C, Pt, W gas units installed
2. Capable of gas mixtures to uniquely tailor depositions
EasyLift nanomanipulator for integrated chunk and lamella lift
NavCam+ for easier sample location/navigation
Vacuum transfer system for processing of samples directly from glovebox environments without exposure to atmosphere
Applications/Software
1. Rocking mill feature for easy reduction in curtaining artifacts
2. IFast Developers Kit for automated routines
3. Auto Slice&View and EBS3/EDS3 for automated serial sectioning/chemical mapping
4. AutoTEM for automated preparation of TEM lamellae
5. MAPS for large area imaging/stitching
The ThermoFisher Helios G4 PFIB DualBeam is designed for high-throughput FIB operations. The Xe ion beam is capable of higher beam currents and correspondingly shorter milling times than the Helios Nanolab Ga-beam FIB. This makes it ideal for large area trenching & milling, 3D materials science, and sample preparation.
The Helios PFIB is the newest dual-beam FIB system in the EML, and is equipped with a suite of features to make high-throughput FIB operations easier than ever. A state-of-the-art electron column pairs with a number of detectors to ensure excellent imaging across a range of conditions. Low kV mode operations can be performed with incredible accuracy and ease, unlocking a number of applications for non-conductive and beam sensitive materials. The Xe ion beam removes the possibility of Ga contamination of samples, and allows for smaller damage layers in most materials, while much higher beam currents deliver orders-of-magnitude increases in milling speed.
Alfa Chemistry, a leader in materials analysis, is committed to providing you with tailor-made analytical service solutions. If you are interested in our ThermoFisher Helios G4 PFIB DualBeam-based materials analysis services, please contact us directly.
For research use only, not intended for any clinical use.
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