Alfa Chemistry' materials analysis laboratories are equipped with world-class materials analysis instruments to provide comprehensive materials analysis services for high-tech companies in materials chemistry, metallurgy and minerals, electrical and electronics, biomedicine, semiconductor, and superconductivity, and nanotechnology to meet their requirements for morphological observation, trace surface analysis, materials composition analysis, and microstructure analysis at sub-micron resolution. We provide you with material analysis solutions based on FEI 200 TEM FIB.
FEI 200 TEM FIB
MANUFACTURER: FEI
The 200 TEM FIB removes material by sputtering using gallium at lateral resolution of approximately 5 nm. Platinum metal can also be deposited by ion beam assisted chemical vapor deposition. Gas assisted etching and selective carbon milling may also be performed. FIB has a wide range of applications:
1. Specimen preparation for SEM and TEM. TEM cross-section specimens can be prepared within two hours.
2. Ion channeling contrast imaging
3. Device modification - mainly semi-conductor industry
Micro machining - example: trimming AFM tips or drilling patterns to make optical grating or optical lenses
1. 30 kV gallium liquid metal ion source
2. Accepts specimens up to 5 cm diameter
3. Ion beam assisted platinum deposition
4. Iodine enhanced etch
5. Selective carbon mill etch
6. Secondary electron and ion images
Alfa Chemistry, a leader in materials analysis, is committed to providing you with tailor-made analytical service solutions. If you are interested in our FEI 200 TEM FIB-based materials analysis services, please contact us directly.
For research use only, not intended for any clinical use.
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Alfa Chemistry provides customized laboratory services to research institutes, universities, and other institutions in the field of chemistry and materials. Our mission is to provide you with comprehensive and powerful technical support.
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