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Lithography Service—Suss MA6 UV mask aligner

Alfa Chemistry's lab team of chemists, technicians, and lab personnel are pros at analytical techniques such as chromatography, spectroscopy, qualitative analysis, gravimetric analysis, quantitative chemical analysis, and many other chemical tests. Our chemists and technicians are knowledgeable and have years of experience providing lithography service based on Suss MA6 UV mask aligner.

Name Of The Instrument/Platform

Suss MA6 UV mask aligner

Introduction

Manual UV mask aligner able to define and align patterns with features sizes down to 1 µm on substrates up to 6” diameter.

Feature Highlights

350 W Hg lamp (OSRAM HBO 350 W/S)
Typical operation in the spectral range of 350-450 nm
Band-pass i-line filter available
Mask size up to 5x5”
Wafer size up to 150 mm
Soft, hard, low vacuum and vacuum contact, as well as proximity exposure
1 µm exposure and alignment resolution
Enhanced Image Storage System (EISS) software for improved alignment capabilities and image capture
Optometer with 365/405 nm sensors for lamp calibration

Alfa Chemistry's lab team of chemists, technicians, and lab personnel are pros at analytical techniques such as chromatography, spectroscopy, qualitative analysis, gravimetric analysis, quantitative chemical analysis, and many other chemical tests. Our chemists and technicians are knowledgeable and have years of experience providing chemical analysis service. If you are interested, please contact us directly.

For research use only, not intended for any clinical use.

Online Inquiry

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