Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Photonic Professional GT2 Nanoscribe-based lithography services to help the semiconductor industry grow.
Photonic Professional GT2 Nanoscribe
The Photonic Professional GT2 Nanoscribe is equipped with a Carl Zeiss Optical Microscope (Objectives with optical magnifications: ×10, ×20, ×25 and ×63) and a laser system (class 3B, wavelength 780 nm, pulse duration 80-120 fs, repetition rate: 80 MHz). This device is intended to be used as 3D printer for the fabrication of polymeric nano/microstructures (nanoscale printing: down to 160nm spatially, microscale printing: 50-700 µm typically, mesoscale printing: in mm dimensionally). The technology is based on a lithographic additive or subtractive process with resins or resists as basic material on a substrate. The Photonic Professional GT2 Nanoscribe is owned and operated by the Selhuber group.
Alfa Chemistry offers lithography services based on Photonic Professional GT2 Nanoscribe. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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