Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Nanoscribe Photonic Professional 3D Lithography System-based lithography services to help the semiconductor industry grow.
Nanoscribe Photonic Professional 3D Lithography System
MANUFACTURER: Nanoscribe GmbH
MODEL: Photonic Professional GT
Specifications
Optics and Resolution
1. Class 3 120 mW, 780 nm, 150 fs, 80 MHz fiber laser
2. 3D lateral feature size: ≤ 200 nm; typically 150 nm
3. 2D lateral feature size: ≤ 150 nm; typically 120 nm
4. 2D lateral resolution: ≤ 500 nm; typically 300 nm
5. Vertical resolution: ≤ 1 μm; typically 800 nm
6. Piezo range: 300 × 300 × 300 μm3
7. Motorized xy-scanning stage range: 100 × 100 mm2O
Equipment Type
• 3D Lithography System
Compatible Materials Nanoscribe resists : IP-L (780), IP-G (780) and IP-Dip SU-8 (25, 50, 100, …) Ormocere AZ MiR 701, AR-P 3210 AZ 5214, AZ 9260 Chalcogenide glass (As2S3) PEG-DA, PETA And many others …
The Nanoscribe Photonic Professional 3D Lithography System is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
Alfa Chemistry offers lithography services based on Nanoscribe Photonic Professional 3D Lithography System. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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