Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Karl Suss MA6 Mask Aligner-based lithography services to help the semiconductor industry grow.
Karl Suss MA6 Mask Aligner
A photolithography spin coating and development station couples the mask aligner.
The MA6 UV optics allows full field exposure of a whole wafer and optimized for steep wall slopes and high resolution. Diffraction effects are minimized with a discrete number of illumination angles smoothing printed features. Depending on the optical wavelength and desired printing method (soft, hard, or vacuum contact and proximity) micron resolutions can be achieved. Motorized wafer and top mounted microscope provide reliable ±0.5 µm mask alignment. The wavelength of UV is 365 nm.
Alfa Chemistry offers lithography services based on Karl Suss MA6 Mask Aligner. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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