Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Karl Süss MJB 4 Mask Aligner-based lithography services to help the semiconductor industry grow.
Karl Süss MJB 4 Mask Aligner
1. The MJB 4 is equipped with a 350W high-pressure mercury-vapor lamp, facilitating exposure at 365 nm and 405 nm.
2. Largest applicable masks are 5" × 5" resulting in sample sizes of at most 4" × 4". The uniformity of illumination over the 4" area is ±2%.
3. An XYΘ-table enables horizontal displacements and rotation with micrometer screws. The optical alignment is handled from top side. The MJB 4 offers vacuum as well as hard and soft contact mode.
Alfa Chemistry offers lithography services based on Karl Süss MJB 4 Mask Aligner. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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