Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Heidelberg DWL 66FS UV Laser Patterning System-based lithography services to help the semiconductor industry grow.
Heidelberg DWL 66FS UV Laser Patterning System
A Heidelberg DWL 66FS UV laser patterning system for the generation of photomasks and direct write onto substrates, such as wafers or individual die. The Heidelberg can provide write resolution capabilities down to 600 nm for substrates up to 9" square. Additionally, it can perform the direct write on wafers or individual die and write 128 levels of grayscale.
Alfa Chemistry offers lithography services based on Heidelberg DWL 66FS UV Laser Patterning System. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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