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Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Genesis HMDS Vapor Prime Oven-based lithography services to help the semiconductor industry grow.
Genesis HMDS Vapor Prime Oven
Due to liquid surface tension, the wet process can have poor contact between the solution and the surface, especially when the surface is textured with small features. Another problem with wet processing, or solution phase deposition, is this process typically uses water.
Standard recipes include HMDS priming and image reversal with ammonia chemistry. Other chemistry and related SAM coatings can be developed on request.
While wet chemical surface modification can be done, vapor phase deposition has become the preferred method for coating surface as the process environment can be tightly controlled.
Alfa Chemistry offers lithography services based on Genesis HMDS Vapor Prime Oven. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
Please fill out the form below and we will get back to you as soon as possible with a quotation for the item you are interested in.
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