Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers FEI Sirion 400 SEM/JC Nabity NPGS E-Beam Lithography-based lithography services to help the semiconductor industry grow.
FEI Sirion 400 SEM/JC Nabity NPGS E-Beam Lithography
MANUFACTURER: FEI
1. Ultra high resolution FE-SEM with 2 nm resolution
2. Motorized stage with full travel over a 100 mm wafer, 60° tilt
3. JC Nabity Nanometer Pattern Generation System (NPGS) e-beam lithography
4. Writes lithography patterns down to less than 15 nm
5. PMMA and developer in stock for e-beam lithography
6. NPGS and CAD software available for office use
Alfa Chemistry offers lithography services based on FEI Sirion 400 SEM/JC Nabity NPGS E-Beam Lithography. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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