Photolithography, also known as optical lithography or UV lithography, is a precision process for patterning parts on thin films or substrates (also known as "wafers"). Photolithography uses light to transfer geometry from a photomask (also known as a "photomask") to a light-sensitive (i.e. photosensitive) chemical photoresist on a substrate. Alfa Chemistry offers Brewer Science Cee Stand-Alone Spin Coater-based lithography services to help the semiconductor industry grow.
Brewer Science Cee Stand-Alone Spin Coater
MANUFACTURER: Brewer Science
MODEL: Cee Model 200cbx
Specifications
1. 0.1-second resolution for step times
2. Spin speed: 0 to 12,000 rpm
3. Spin speed acceleration:
1) 0 to 30,000 rpm/s unloaded
2) 0 to 23,000 rpm/s 200-mm substrate
3) 0 to 3,000 rpm/s 6" × 6" × 0.250" photomask recessed chuck
Equipment Type
• Spin Coater
The Brewer Science Cee Stand-Alone Spin Coater/hotplate is dedicated for the spinning of electron beam resists. The tool is capable of spin coating substrates up to 7" square or 200-mm round and features high torque for maximum ramping capability. You can also spin coat smaller size substrates (<1 cm through 200 mm) using a wide array of spin-coating chuck sizes. The precision hotplate has a temperature range from ambient to 300℃ with resolution of +/- 0.1℃ and uniformity of 0.3% across the working surface.
Alfa Chemistry offers lithography services based on Brewer Science Cee Stand-Alone Spin Coater. If you are interested, please feel free to contact us.
For research use only, not intended for any clinical use.
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