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Etching Service—Reactive Ion Etcher (RIE) - Oxford PlasmaPro 80

Chemical etching can help reveal hidden anomalies or defects such as cracks, rings, or corrosion in materials or components. Alfa Chemistry' experts have experience in different types of advanced chemical etching including aluminium clean etching, anodic etching, blue etching anodizing, and nitric acid ethanol etching. We offer etching services based on Reactive Ion Etcher (RIE) - Oxford PlasmaPro 80.

Name Of The Instrument/Platform

Reactive Ion Etcher (RIE) - Oxford PlasmaPro 80

Summary

1. Open load design allows fast wafer loading and unloading
2. Up to 200 mm wafers
3. Processes: SiN, NbN, Si, . . .

Alfa Chemistry offers Reactive Ion Etcher (RIE) - Oxford PlasmaPro 80-based etching services, please feel free to contact us if you are interested.

For research use only, not intended for any clinical use.

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