Chemical etching can help reveal hidden anomalies or defects such as cracks, rings, or corrosion in materials or components. Alfa Chemistry' experts have experience in different types of advanced chemical etching including aluminium clean etching, anodic etching, blue etching anodizing, and nitric acid ethanol etching. We offer etching services based on Plasma-Therm Versaline ICP RIE.
Plasma-Therm Versaline ICP RIE
1. Typically used for etching aluminum and aluminum nitride
2. 500 W RF power supply
3. 4" wafers or smaller samples mounted to 4" carrier wafers
4. Available Gases: Cl2, BCl3, Ar, O2.
Alfa Chemistry offers Plasma-Therm Versaline ICP RIE-based etching services, please feel free to contact us if you are interested.
For research use only, not intended for any clinical use.
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