Chemical etching can help reveal hidden anomalies or defects such as cracks, rings, or corrosion in materials or components. Alfa Chemistry' experts have experience in different types of advanced chemical etching including aluminium clean etching, anodic etching, blue etching anodizing, and nitric acid ethanol etching. We offer etching services based on Oxford 100 ICP RIE.
Oxford 100 ICP RIE
Gas Selection: Cl2, BCl3, CH4, SF6, CHF3, CF4, O2, Ar, H2
Coil and Bias Powers: 600 W and 3000 W
Compatible Materials*: Si, SiO, SiN, GaAs, GaN, Al, AlN, AlO, LiNbO, InP, Parylene, HBN, FTO, MoS2, Carbon, Ni, SiC, +PR, -PR, PMMA
Banned Materials*: Au, Ag, Pt, Cu, Magnetics
Due to the ever-changing nature of research, and the sensitive nature of the equipment these lists are incomplete. Please contact a staff member to discuss etch plans before attempting to introduce a new material to the system.
The Oxford 100 is critical to several research applications at Alfa Chemistry. It has the largest variety of etch gases available and can handle the largest variety of research samples, including III-V materials, semiconductors, and select metals. This load locked system requires samples to either be 4 inch wafers, or mounted on 4 inch wafers. In addition to deep silicon etching, this system is also capable of etching a limited selection of dielectrics and other materials.
Alfa Chemistry offers Oxford 100 ICP RIE-based etching services, please feel free to contact us if you are interested.
For research use only, not intended for any clinical use.
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