Chemical Vapour Deposition (CVD) is a chemical technique for the epitaxial deposition of films of solid materials on the surface of a substrate in the gas phase of a controlled chemical reaction. CVD, also known as thin film deposition, is widely used in electronics, optoelectronics, catalysis, and energy applications such as semiconductors, silicon wafer preparation, and printable solar cells. Alfa Chemistry offers you PVD 75 Electron Beam Deposition System-based chemical vapor deposition services.
PVD 75 Electron Beam Deposition System
The PVD 75 is versatile system that can be used for a variety of thin film deposition applications. The Electron beam Evaporation has the following features:
1. Telemark 4 Pocket E-Gun
2. 5.5 kW Power Supply
3. Source Shutter
It is used mainly for metal deposition, such as Al, Cu, Ti, etc (no Au or Ag is allowed).
Alfa Chemistry offers you the technical support for chemical vapor deposition which has been widely used for the purification of substances, the development of new crystals, and the precipitation of various inorganic thin film materials in single, polycrystalline or glassy forms. If you are interested, please contact us directly.
For research use only, not intended for any clinical use.
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Alfa Chemistry provides customized laboratory services to research institutes, universities, and other institutions in the field of chemistry and materials. Our mission is to provide you with comprehensive and powerful technical support.
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