Chemical Vapour Deposition (CVD) is a chemical technique for the epitaxial deposition of films of solid materials on the surface of a substrate in the gas phase of a controlled chemical reaction. CVD, also known as thin film deposition, is widely used in electronics, optoelectronics, catalysis, and energy applications such as semiconductors, silicon wafer preparation, and printable solar cells. Alfa Chemistry offers you EasyTube Diffusion Furnace Quick Info-based chemical vapor deposition services.
EasyTube Diffusion Furnace Quick Info
This is a four tube diffusion furnace for growing oxides, diffusions, and annealing. Two of the tubes are capable of growing oxides using hydrogen and oxygen to form steam (wet oxidation), or using strictly oxygen (dry oxidation). All tubes are sealed during process and prepurged with inert gas before admitting process gas. The computer interface allows recipe editing and data logging of the process in each tube, a system control program monitors all vital services to furnace and safety features.
Alfa Chemistry offers you the technical support for chemical vapor deposition which has been widely used for the purification of substances, the development of new crystals, and the precipitation of various inorganic thin film materials in single, polycrystalline or glassy forms. If you are interested, please contact us directly.
For research use only, not intended for any clinical use.
Please fill out the form below and we will get back to you as soon as possible with a quotation for the item you are interested in.
Alfa Chemistry provides customized laboratory services to research institutes, universities, and other institutions in the field of chemistry and materials. Our mission is to provide you with comprehensive and powerful technical support.
Privacy Policy | Cookie Policy | Copyright © 2025 Alfa Chemistry. All rights reserved.