Sreedhara MB, Ghatak J, Bharath B, Rao CN.
ACS Appl Mater Interfaces. 2016 Dec 29. doi: 10.1021/acsami.6b14882. [Epub ahead of print]Ultrathin epitaxial films (10 to 90 nm thick) of V2O5 have been grown on c-Al2O3 by atomic layer deposition using vanadyl acetylacetonate as the vanadium precursor along with oxygen plasma. Various process parameters have been optimised for the purpose, and excellent crystalline films could be obtained below 200 °C, with out the need for post-heat treatment. With a moderate temperature window, the ... Read More