Kawasaki M1, Hsiao CN2, Yang JR3, Shiojiri M4.
Micron. 2015 Jul;74:8-14. doi: 10.1016/j.micron.2015.03.012. Epub 2015 Apr 5.We have fabricated Ru and Pt nanocomposite films using plasma-enhanced atomic layer deposition (PE-ALD), and characterized their structure by means of analytical electron microscopy. Pt and Ru were deposited in Ar/O(2) plasma using trimethyl(methylcyclopentadienyl) platinum(IV) and bis(cyclopentadienyl)Ru(II) or bis(ethylcyclopentadienyl)Ru(II) as precursors, respectively. The resistivity of a Pt film deposited on a Si substrate at 300°C was 16. Read More