Becerra R1, Boganov SE, Egorov MP, Faustov VI, Krylova IV, Nefedov OM, Promyslov VM, Walsh R.
J Phys Chem A. 2008 Feb 7;112(5):849-57. doi: 10.1021/jp710740a. Epub 2008 Jan 15.Time-resolved studies of silylene, SiH2, and dimethylsilylene, SiMe2, generated by the 193 nm laser flash photolysis of appropriate precursor molecules have been carried out to obtain rate constants for their bimolecular reactions with dimethylgermane, Me2GeH2, in the gas phase. SiMe2 + Me2GeH2 was studied at five temperatures in the range 299-555 K. Problems of substrate UV absorption at 193 nm at temperatures above 400 K meant that only three temperatures could be used reliably for rate constant measurement. Read More