Shi YJ1, Li XM, Toukabri R, Tong L.
J Phys Chem A. 2011 Sep 22;115(37):10290-8. doi: 10.1021/jp203966h. Epub 2011 Aug 25.The effect of the Si-H bond on the gas-phase reaction chemistry of trimethylsilane in the hot-wire chemical vapor deposition (HWCVD) process has been studied by examining its decomposition on a hot tungsten filament and the secondary gas-phase reactions in a reactor using a soft laser ionization source coupled with mass spectrometry. Trimethylsilane decomposes on the hot filament via Si-H and Si-CH(3) bond cleavages. Read More