Brandow SL1, Chen MS, Dulcey CS, Dressick WJ.
Langmuir. 2008 Apr 15;24(8):3888-96. doi: 10.1021/la703326m. Epub 2008 Feb 27.We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaging layers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterized using water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Read More